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In this paper, we present a high performance planar 20nm CMOS bulk technology for low power mobile (LPM) computing applications featuring an advanced high-k metal gate (HKMG) process, strain engineering, 64nm metal pitch & ULK dielectrics. Compared with 28nm low power technology, it offers 0.55X density scaling and enables significant frequency improvement at lower standby power. Device drive...
We propose a Loadless 4T SRAM cell using degenerately doped source (DDS) p-channel In0.53Ga0.47As Tunnel FETs (TFETs) as dual purpose access/load devices and low leakage steep sub-threshold n-channel TFETs as drive devices. A Loadless 4T CMOS SRAM cell has the requirement that the leakage current of the PMOS access transistors should be larger than the leakage current of the NMOS drive transistors...
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