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Carbon nitride (CN x ) thin films with high nitrogen content were deposited on Si (100) substrates by using electron cyclotron resonance nitrogen plasma assisted pulsed laser deposition (ECR-PLD), and their thermal stability were studied by examining their composition and bonding behaviors upon post-deposition heat annealing in vacuum and in nitrogen ambient. The as-deposited films contain...
The influence of nitrogen plasma generated by electron cyclotron resonance (ECR) microwave discharge on deposition of carbon nitride films by means of ECR plasma assisted reactive pulsed laser deposition was investigated by a comparative study on the optical emission of the plume produced by pulsed laser ablation of a graphite target in ECR nitrogen plasma, in vacuum and in low-pressure nitrogen gas...
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