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Zirconium nitride (ZrN) and titanium nitride (TiN) thin films were deposited on Si(100) substrates using hollow cathode discharge ion-plating (HCD-IP) and unbalanced magnetron (UBM) sputtering methods, respectively. Design of experiment (DOE) has long been recognized as a powerful method to optimize a complex process in industry. The purposes of present study were to verify the feasibility and reliability...
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