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Microwave Plasma Chemical Vapor Deposition (MPCVD) method can be used to grow various kinds of diamond films and carbon nanotubes at various temperatures. However, it is usually only the hand-on experience that can be relied on to obtain the nearly satisfactory plasma in the MPCVD system. Therefore, this study set up the reflected power sensor as a reference parameter and used a CCD (Charge Coupled...
The microwave plasma chemical vapor deposition (MPCVD) method has been widely used in several industry applications. The plasma modeling and control issues play an important role in MPCVD systems. One of crucial factors in controlling plasma shape and position is the tunable reflected microwave power of the MPCVD system. However, modeling the tunable reflected power of microwave plasma is highly complex...
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