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Today, several methods are used for secondary ion yield enhancement in time‐of‐flight SIMS (ToF‐SIMS). Some deal with the modification of sample properties, e.g. with monolayer preparation of analytes on metal substrates instead of thick layers, or the metalization of thick‐layer samples with noble metals like gold or silver (MetA‐SIMS). Other methods deal with primary ion beam parameters, e.g. the...
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