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In this study, we investigated the structural and electrical properties of TiO2/Ta2O5 stacks prepared using DC reactive magnetron co-sputtering for as-deposited films and films annealed at 700 °C. X-ray diffraction studies revealed that the as-deposited films were amorphous, whereas those annealed at 700 °C were polycrystalline with mixed phases of TiO2 and β-phase Ta2O5. The presence of mixed phases...
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