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We have fabricated the stacked interconnects of multi-layer graphene (MLG) and nickel (Ni) at the line width from 30 to 1000 nm in 300 mm wafer. MLG, which was grown by CVD process, was selectively deposited on Ni damascene interconnects by the catalytic reaction of Ni. MLG grown from C2H2 was composed of approximately 20 layers of graphene sheets and covered the overall surface of Ni interconnects...
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