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This paper presents an acidic texturing and a novel vapor texturing method for Edge-defined Film-fed Growth (EFG) multi-crystalline silicon (mc-Si) wafers. P-type EFG mc-Si wafers with resistivity 0.5–2Ωcm and thickness of 300±70μm were textured with acidic solution using HF:HNO 3 :CH 3 COOH. The reflectance decreased as the acid etching proceeded and then saturated when the etching...
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