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We report etch-rate and probe-beam-deflection studies of N-BK7 glass ablated using a 157-nm F2 laser. It is found that controllable material removal at the nanometre level is possible above an ablation threshold of 250 mJ cm-2. Contact mask printing shows well-defined features can be micromachined in this glass with sub-micron resolution capability. Micro-features produced in this way have been replicated...
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