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Laser interference lithography technique was adopted to fabricate subwavelength metallic structures. One-dimensional (ID) grating structures, two-dimensional (2D) grid patterns, and 2D particles array were obtained on the photoresist film by means of direct exposing the resist using the interference patterns. Then the photoresist patterns were transferred to the quartz substrate by wet etching and...
An interference lithography technique was adopted to fabricate Ag dots array. It has advantages of mask free, cost effective, and good controllability compared to the conventional nanosphere lithography (NSL) method. One-dimensional (1D) grating structures, two-dimensional (2D) grid patterns, and 2D dots array were obtained on the photoresist film by means of direct exposing the resist using the interference...
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