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Reactive ion etching (RIE) has been used to etch micron-sized holes which are several microns in depth in lithium niobate, mostly on Y- and Y-rotated cut substrates, the underlying idea being the realization of phononic crystal devices. The etching process is based on the use of sulfur hexafluoride as the etching gas. Photoresist and sputtered or electroplated metals masks were used and compared to...
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