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A novel 3D porous Si–O–C/Ni thick film anode is successfully prepared by electrodeposition of porous Ni on Cu substrate and galvanostatical electrodeposition of Si–O–C composite on porous Ni substrate. The 3D porous Si–O–C/Ni thick film is electrochemically activated at a current density of 50 μA cm−2 for the first cycle and 200 μA cm−2 (0.5 C) for the subsequent cycles, it displays superior electrochemical...
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