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Effects of surface passivation and the interfacial layer on the reliability characteristics of Al/HfYO x /GaAs metal-oxide-semiconductor capacitor structures are reported. Stress-induced leakage current mechanism, critical for understanding the degradation and breakdown in Al/HfYO x /GaAs capacitors, has been studied in detail. While the devices fabricated with (NH 4 ) ...
This paper deals with the leakage current variation occurring in Al/HfYOx/GaAs capacitors subjected to constant electrical stress. It is shown that the current-time characteristic of such structures follows a power-law logistic model that arises from an extension of the Curie-von Schweidler law. The proposed model is based on an equivalent electrical circuit representation of the degraded structure...
The electrical characteristics and reliability of HfO2-based p-GaAs metal-oxide-semiconductor (MOS) capacitors (EOT: 2.4 nm to 4.8 nm) with a thin Silicon (Si) interfacial passivation layer (IPL) have been investigated with different thicknesses of HfO2. SILC generation kinetics and flat band instability were investigated via CVS and CCS measurements. In addition, breakdown voltages of gate oxide...
Reliability characteristics of ZrO2 gate dielectric films on p-GaAs with ultrathin silicon (Si) interfacial passivated layer have been investigated. Results of a systematic study on the impacts of post deposition annealing (PDA) on the physical and electrical properties of RF-sputtered ZrO2 dielectric layers on Si-passivated p-GaAs substrates are reported. The electrical characteristics have been...
Electrical and reliability characteristic of Hf-based GaAs metal-oxide-semiconductor (MOS) capacitors (TaN/HfO2/HfOxNy/p-GaAs) with ultrathin HfOxNy interfacial layer is investigated. Charge trapping behavior has been studied under both the DC and dynamic voltage stressing. Transient response and the degradation mechanism of the dielectric have been studied both under positive and negative DC gate...
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