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This paper reports a nanocone-forest silicon surface fabricated by an improved DRIE process using SF6/C4F8 in cyclic etching-passivation process, which is maskless, controllable, effective and large-size. As well known, optical property of textured silicon surface is determined mainly by its surface structure, and surface structure is determined by process conditions. In this work, process conditions...
This paper reports a single-step process to fabricate superhydrophobic micro/nano dual-scale (MNDS) poly(dimethylsiloxane) (PDMS) membrane replicated directly from ultra-low-surface-energy MNDS silicon substrate at high temperature without surfactant coating. MNDS silicon surface with ultra-low surface energy was simply fabricated by an improved deep reactive ion etching (DRIE) process. The huge reduction...
This paper puts forward a description method for surface topography of black silicon using SF6/C4F8 in a cyclic etching-passivation DRIE process. Three main parameters, i.e. density, height and width, are defined and used to describe black silicon and can be extended to several other parameters, such as aspect ratio, duty ratio and so on. By means of these parameters we can also establish a standard...
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