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This paper reports a nanocone-forest silicon surface fabricated by an improved DRIE process using SF6/C4F8 in cyclic etching-passivation process, which is maskless, controllable, effective and large-size. As well known, optical property of textured silicon surface is determined mainly by its surface structure, and surface structure is determined by process conditions. In this work, process conditions...
This paper presents the fabrication of squama-shape micro/nano multi-scale structures and the analysis of the interaction among different scale structures during fabrication processes. Well-designed microstructures made of inverted pyramids and V-shape grooves are fabricated by KOH wet etching. High-dense high-aspect-ratio nanostructures are realized atop microstructures by an improved maskless deep...
This paper puts forward a description method for surface topography of black silicon using SF6/C4F8 in a cyclic etching-passivation DRIE process. Three main parameters, i.e. density, height and width, are defined and used to describe black silicon and can be extended to several other parameters, such as aspect ratio, duty ratio and so on. By means of these parameters we can also establish a standard...
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