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AlN layers of thickness of about 2μm have been grown with AlN nucleation layers (NLs) on (001) sapphire substrates using metal organic chemical vapor deposition. Increasing the AlN-NL deposition temperature from 850 to 1250°C has been found to have significant effect on the surface morphology and the structural quality of the AlN layers. The surface morphology of the AlN-NLs and the AlN layers has...
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