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Tin oxide thin films were grown by chemical vapor deposition on glass substrates at atmospheric pressure and temperatures of 400, 500, and 600°C over deposition times from 15 to 60 min with 15-min intervals to investigate the effect of deposition time. A homemade horizontal reactor was used for deposition from SnCl2 + 2H2O precursors with pure oxygen flowing at a rate of 5 ccpm. The structure was...
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