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Successive ionic layer adsorption and reaction (SILAR) is a process for depositing uniform, crystalline and conformal thin films by alternating exposures to cations and anions. SILAR has been successfully demonstrated for many metal oxides, but not for titanium dioxide (TiO 2 ). Here we demonstrate process for deposition of TiO 2 thin films using SILAR method. Titanium tri-chloride...
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