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Top gate, global back gate and buried gate CNTFET structures with a channel length of 5.9 nm are studied in the scope of the 2026 ITRS requirements. The studies are performed using a numerical device simulator. Figures of merit and performance parameters such as the switching speed, the switching energy, Ion/Ioff-ratio, among others, are obtained for each structure and compared with the 2026 ITRS...
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