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Thin films of amine functionalised mesoporous silica were deposited on tin-doped indium oxide (ITO) slides by dip-coating mixtures of TEOS (tetraethyl orthosilicate), APTES ((3-aminopropyl)triethoxysilane), and the non-ionic surfactant Brij56. The pore structure of the films was found to depend on the temperature use during calcination to remove the templates. Films calcined at 350°C had highly ordered...
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