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NiCo alloy films 180-nm thick were deposited on MgO(001) substrates at 280°C by de plasma-sputtering at 2.5 kV in pure Ar gas using a Ni 90 Co 10 target. A bias voltage, V s , of 0, −110, −140 or −180 V was applied to the substrate during deposition. The structural and electrical properties of the films were studied as a function of V s by X-ray photon electron spectroscopy,...
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