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The usability of ZEP520A as resist for thermally activated selective topography equilibration (TASTE) was investigated. It was found that (i) a high-contrast resist such as ZEP520A is well suitable for grayscale electron-beam lithography, (ii) a selective thermal reflow is possible with ZEP520A and (iii) reflow is governed by the same energy minimization principle as known from poly (methyl methacrylate)...
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