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The traditional control strategy of active power filter (APF) has low accuracy and bad robustness. Firstly, a state-space model of shunt APF is established. Taking errors as unknown disturbance to the system, a robustness controller is designed based on the Hinfin control theory. Secondly, the fuzzy PI control with self-adjustable factor is applied in the DC-link voltage control of APF. The self-adjustable...
In semiconductor manufacturing process, the thickness and extinction coefficient are two important properties of photoresist which need careful estimation and control. Wafer warpage is common in microelectronics processing due to stress induced. In this paper, the effect of warpage on the accuracy of resist properties estimation is investigated and an in-situ calibration method is proposed. We will...
Critical dimension (CD) or linewidth is one of the most critical variables in the lithography process with the most direct impact on device speed and performance of integrated circuits. The extinction coefficient is a photoresist property that can have an impact on the CD uniformity. The extinction coefficient is a measure of the absorption of the photoresist and determines the required exposure dose...
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