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ZnO thin films were deposited on polyethersurfone (PES) substrates by atomic layer deposition (ALD). We investigated the effects of O2 plasma pretreatment from 0 W to 100 W before the ZnO growth. When the plasma power was increased, the PET substrate surface roughness was also increased. However, the surface roughness of ZnO on the roughest PET substrate with maximum plasma power pretreatment showed...
New transparent conductive films that had a sandwich structure composed of ITO/Cu/ITO multilayer films were prepared by a conventional RF and DC magnetron sputtering process on a polycarbonate substrate without intentional substrate heating. The thickness of each layer in the ITO/Cu/ITO films was kept constant at 50nm/5nm/45nm. The optoelectrical and structural properties of the films were compared...
Transparent and conducting ITO/Au/ITO multilayered films were deposited without intentional substrate heating on polycarbonate (PC) substrate using a magnetron sputtering process. The thickness of ITO, Au and ITO metal films in the multilayered structure was constant at 50, 10 and 40nm, respectively.Although the substrate temperature was kept constant at 70°C, ITO/Au/ITO films were polycrystalline...
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