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The radially expanding plasma plume generated in a Hot Refractory Anode Vacuum Arc was used to deposit thin Al and Zn films on glass substrates. The electrode separation was 10mm, arc time varied up to 165s, and current (I) was 100–225A. The cathode was a water-cooled Al or Zn cylinder. A graphite anode with 9 or 30mm height was used with the Al cathode, and 10 or 30mm height Mo anode was used with...
An Er plasma was produced by a vacuum arc source with a truncated cone-shaped Er cathode and an annular copper anode. The plasma beam was injected into a cylindrical magnetic duct through the annular anode aperture and flowed towards the substrate or an electrostatic ion current probe positioned on the duct axis, in vacuum or in a low-pressure oxygen background. The cathode spot operation, transport...
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