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Epitaxial GaAs1−xNx thin films were grown on GaAs (001) substrates through solid-source molecular beam epitaxy using an RF plasma source for incorporating nitrogen. We examined the thin films grown under different nitrogen background pressures (NBPs) using various ex-situ techniques. GaAs0.969N0.031 thin films grown under a high NBP of 5.5 × 10−6 Torr exhibited thickness variation-induced Pendellösung...
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