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Ni/Al multilayer films were deposited by dc magnetron sputtering from pure nickel and aluminium targets. Films with periods between 5 and 140nm were produced. All the multilayers were tailored in order to have an overall atomic composition close to 50Al:50Ni. The as-deposited films are constituted by alternate nickel and aluminium layers that upon thermal annealing react with each other to form intermetallic...
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