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Ultra-thin ZrB x O y films 5 nm in thickness were prepared by radio-frequency (rf) magnetron sputtering. The thermal stability and the barrier performance against the inter-diffusion between Cu and Si were studied via thermal annealing at different temperatures. The as-deposited amorphous ZrB x O y thin films could effectively block the inter-diffusion of Cu and Si...
Single-phase β-FeSi 2 films were fabricated on silicon (100) substrates by pulsed laser deposition (PLD) technique and post-annealing process. The X-ray diffraction (XRD) showed that the diffraction intensity reached a certain threshold and then decreased with the increase of annealing time. The scanning electron microscopy (SEM) observations revealed surface morphologies of the films for...
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