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This paper evaluates chromium aluminum silicon nitride (CrAlSiN) hard films fabricated using reactive magnetron co-sputter with adjusted deposition parameters. The hard films were prepared on glass and tungsten carbide tools at a substrate temperature of 350°C. The targets were Cr, W and Si, with 40sccm Ar as the plasma gas and 40sccm N2 as the reactive gas. An orthogonal array, the signal-to-noise...
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