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CeO 2 thin films were deposited on quartz substrates by using the rf-sputtering technique. The 80-keV Ni - ion-implanted and, subsequently, post-annealed films have shown the formation of Ni oxide and Ni metallic phases at 7at% of Ni concentration. Such secondary phases were dissolved by swift heavy ion irradiation with 200-MeV Ag +15 ion beams. Structural properties, surface...
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