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Anatase phase TiO2 (a-TiO2) films have been fabricated on LaAlO3(001) substrates at the substrate temperatures of 500 to 650°C by the metal organic chemical vapor deposition (MOCVD) method using tetrakis-dimethylamino titanium (TDMAT) as the organometallic (OM) source. The structural studies revealed that the TiO2 film prepared at 600°C had the best single crystalline quality with no twins. The out-of-plane...
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