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In this paper, a hybrid system consisting of metal nano‐particles dispersed on the surface of a dielectric layer is presented: a remote Expanding Thermal Plasma CVD system is used for the deposition of the inorganic (i.e. SiO2) layers from hexamethyldisiloxane/oxygen mixtures in combination with an rf magnetron sputtering tool for the deposition of metallic (i.e. gold) nanoparticles on top of the...
Cover: Hybrid remote expanding thermal plasma CVD/RF magnetron sputtering system to produce metallic nanoparticles dispersed on the surface of a dielectric layer. The shape, size, size distribution and area coverage of the metallic nanoparticles are controlled by the RF‐power, expanding thermal plasma parameters and time of deposition. Further details can be found in the article by H. T. Beyene,*...
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