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Bismuth iron oxide films with varying contributions from Fe2O3 or Bi2O3 were prepared using atomic layer deposition. Bismuth (III) 2,3-dimethyl-2-butoxide, was used as the bismuth source, iron(III) tert-butoxide as the iron source and water vapor as the oxygen source. The films were deposited as stacks of alternate Bi2O3 and Fe2O3 layers. Films grown at 140°C to the thickness of 200–220nm were amorphous,...
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