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Thin film WO 3 photoanodes were prepared by reactive sputtering in Ar and O 2 gas mixtures of various flow rate combinations. Furnace annealed films were nanocrystalline monoclinic WO 3 with (002), (020) and (200) plane orientations. Water oxidation in 0.33 M H 2 SO 4 electrolyte under simulated solar illumination showed that photoanodes deposited in highest...
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