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The degradation of nMOSFETs induced by nondestructive electrostatic discharge-like (ESD-like) stress in a 32-nm bulk CMOS technology was studied using I- V characteristics and charge pumping measurements. The impact of stress on drain saturation current (Idsat), threshold voltage (Vt), transconductance peak (gm), and subthreshold swing (SS) is reported. For ESD stress applied on the drain, little...
We present an improved wafer-level VFTLP measurement system. This system produces pulses with sub-150 ps rise time and few distortions at the rising edge. By introducing a broadband power divider, the oscilloscope no longer limits the pulse amplitude, and arbitrarily high pulse voltages can be measured. Turn-on effects in diodes and NMOSFETs are investigated using this system.
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