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The scanning electron microscope image featured on the front cover shows a three‐dimensional polydimethylsiloxane (PDMS) molded film bonded on a glass rod. Multilevel silicon structures used to mold the PDMS film were fabricated from successive steps of detachment lithography of photoresist films, which are patterned with lithography and reactive ion etching, as reported by J. Yeom and M. A. Shannon...
A technique to create arrays of micrometer‐sized patterns of photosensitive polymers on the surface of elastomeric stamps and to transfer these patterns to planar and nonplanar substrates is presented. The photosensitive polymers are initially patterned through detachment lithography (DL), which utilizes the difference in adhesion forces to induce the mechanical failure in the film along the edges...
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