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The bacterial strains of Rhodococcus sp. S3E2 and Rhodococcus sp. S3E3 were selected for adhesion study on Teflon-like or organosilicon thin films deposited on paper substrate in atmospheric pressure surface barrier discharge. As a carrier gas the nitrogen with small admixture of octafluorocyclobutane or hexamethylenedisiloxane was used. The influence of octafluorocyclobutane and hexamethylenedisiloxane...
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