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The tribological properties of nano-Cu lubricating additives and electroless deposited Ni-W-P coating as well as their synergistic effect are researched using ring-block abrasion testing machine and Energy Dispersive Spectrometer. Research results show that the wear resistance of Ni-W-P alloy coating after heat treatment at 400°C has greatly increased since the Second Phase Ni3P particles were educed...
X-ray photoelectron spectroscopy (XPS) was used to examine the initial stages of copper deposited by Physical vapor deposition (PVD), or sputter deposition, interacting with amorphous silicon:carbon:hydrogen (a-Si:C:H) films and hydroxyl modified amorphous silicon:carbon:hydrogen (a-Si:C:H/OH) films under Ultra-high vacuum (UHV) conditions. Amorphous-Si:C:H films were formed by condensing vinyltrimethylsilane...
The TaSiO 6 films, ~6 Å thick, were formed by sputter deposition of Ta onto ultrathin SiO 2 substrates at 300 K, followed by annealing to 600 K in 2 Torr O 2 . X-ray photoelectron spectroscopy (XPS) measurements of the films yielded a Si(2p) binding energy at 102.1 eV and Ta(4f 7/2 ) binding energy at 26.2 eV, indicative of Ta silicate formation. O(1s) spectra...
A critical issue in Cu/low-k integration is the wetting and adhesion of Cu to the barrier substrate. The data reported here demonstrate that the oxidation of a thin Ta film on SiO/sub 2/ results in the formation of a thin (/spl sim/6 /spl Aring/) silicate-like film which displays excellent wettability towards Cu at 300 K.
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