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The (1102) α-Al 2 O 3 surface and the initial nitriding AlN layer are investigated using the atomic-force microscope. The initial nitriding method is to convert the (1102) α-Al 2 O 3 surface to a nanometer-thick AlN single-crystal buffer layer. The epitaxial AlN film is deposited by metalorganic chemical vapor deposition with and without the initial nitriding. Atomic...
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