The Infona portal uses cookies, i.e. strings of text saved by a browser on the user's device. The portal can access those files and use them to remember the user's data, such as their chosen settings (screen view, interface language, etc.), or their login data. By using the Infona portal the user accepts automatic saving and using this information for portal operation purposes. More information on the subject can be found in the Privacy Policy and Terms of Service. By closing this window the user confirms that they have read the information on cookie usage, and they accept the privacy policy and the way cookies are used by the portal. You can change the cookie settings in your browser.
We report here for the first time, preparation of the ilmenite titanate MgTiO 3 thin films on Si and SrTi03 substrates by atmospheric pressure metalorganic chemical vapor deposition (APMOCVD) technique. Magnesium acetylacetonate [Mg(acac) 2 ] and titanium isopropoxide [TIP] were used as the Mg and Ti precursors, and O 2 was the oxidizing gas. The deposited films were investigated...
Magnesium oxide (MgO) thin films have been prepared on Si(100), SiO 2 (100)/Si and Pt(111)/Si substrates by atmospheric-pressure metalorganic chemical vapor deposition (AP-MOCVD) for the first time. The relationship between the temperature of substrates (T s ) and crystallographic orientations was also investigated. Magnesium acetylacetonate [Mg(CH 2 COCH 2 COCH ...
Set the date range to filter the displayed results. You can set a starting date, ending date or both. You can enter the dates manually or choose them from the calendar.