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Diamond-like carbon (DLC) films using various inert gases, He, Ne, Ar-methane mixture were deposited by a magnetically enhanced plasma chemical vapor deposition (CVD). The deposition rates and mechanical properties in terms of stress, hardness and Young's modulus of the DLC films under various substrate bias voltage and inert-gas/methane ratios were studied. At a fixed inert-gas/methane ratio (10%),...
A magnetically enhanced plasma chemical vapor deposition (MEPCVD) system has been developed for the deposition of DLC film without deterioration of the film quality. A perpendicular magnetic field (B) to the electric field was applied in the RF capacitively coupled plasma enhanced (PE) CVD system. Significantly higher levels of ionization are achieved in the MEPCVD system, resulting in much lower...
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