The Infona portal uses cookies, i.e. strings of text saved by a browser on the user's device. The portal can access those files and use them to remember the user's data, such as their chosen settings (screen view, interface language, etc.), or their login data. By using the Infona portal the user accepts automatic saving and using this information for portal operation purposes. More information on the subject can be found in the Privacy Policy and Terms of Service. By closing this window the user confirms that they have read the information on cookie usage, and they accept the privacy policy and the way cookies are used by the portal. You can change the cookie settings in your browser.
Many IC and CIS manufacturers still rely heavily on batch high energy ion implanters such as the Axcelis HE3 and Paradigm XE systems. Angle control continues to become increasingly important with the scaling of devices and the increasing use of channeled implants to reduce the number of implant steps needed to produce a box-like dopant profile. The use of channeled implants limits the use of batch...
The temperature effect for buried channel PMOS transistor characteristics was investigated. Generally, only dose, energy and implant angle have been considered as the major parameters for process matching between different high current implanters in transistor manufacturing. However, as the device is scaled down to sub-100 nm size, additional parameters such as instantaneous dose rate and wafer temperature...
This paper presents a method to minimize cross-wafer threshold voltage variation, specifically radial variation, on device wafers using the inherent characteristics and repeatability of a bell-jar hot wall RTP system. The temperature uniformity of Axcelis' bell-jar hot wall RTP is controlled by a three-zone temperature gradient. It is possible to change the cross-wafer thermal uniformity from a flat...
Set the date range to filter the displayed results. You can set a starting date, ending date or both. You can enter the dates manually or choose them from the calendar.