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An innovative approach for the high‐throughput, rapid, and low‐cost fabrication of ultranarrow graphene nanoribbons (GNRs) using nanosphere lithography (NSL) nanopatterning in combination with low‐power O2 plasma etching is presented. The intrinsic simplicity of NSL patterning enables this fabrication approach to be applicable for the straightforward on‐chip fabrication of GNRs and bandgap tuning...
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