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We present the preparation and electrical characterization of an electrically conductive blend of polyaniline (PANi) and SU-8 UV micropatternable photoresist that offers promising opportunities for MEMS applications. The blend was prepared by shear mixing of PANi and SU-8 2010 resist at an rpm of 1,000 for 15 h. The composite was spin-coated on a silicon wafer at an 850 rpm in order to achieve a thickness...
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