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Surface Modification
Surface modification of Ir substrates under bias conditions by microwave plasma chemical vapor deposition is due to a combination of processes caused by the ion bombardment. Two novel microstructures of epitaxial Ir3Si particles and preferentially aligned surface structures are reported in article number 2100810 by Bing Dai, Jiaqi Zhu, and co‐workers.
To understand the process window of bias‐enhanced nucleation of diamond, it is important to study surface modifications of Ir substrates that occur under different conditions. Herein, various microstructures formed on Ir substrates are reported. The first microstructure contains rectangular particles with a size of several hundred nanometers obtained at a relatively high pressure of 12.5 kPa and...
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