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In this letter, a WR-1.0 rectangular waveguide band-pass filter is designed, which is fabricated using the deep reactive ion etching (DRIE) micromachining on silicon wafers. The filter consists of four inductive irises. Using Ansoft HFSS, the center frequency of the filter is at 805GHz and the insertion loss is about 1.5 dB within the 21GHz bandwidth. Effects of the DRIE process brought to the filter...
WR-1.0 rectangular waveguide cavity band-pass filter based on micromaching technique is designed in this letter. The filter consists of two resonant cavities. A transmission zero is implemented by means of broaden stubs. The stub is broaden to the width of the resonant cavity, which simplify the fabrication. The proposed filter is fabricated using the deep reactive ion etching (DRIE) micromachining...
A waveguide quadrature-hybrid coupler operating from 350 to 410 GHz is designed and fabricated using the deep reactive ion etching (DRIE) silicon micromachining technique. The four-port branch-line coupling configuration with five branches is used as the basic structure of the coupler. The size of the coupler is about 6.3 mm × 6.3 mm × 1 mm, which is much smaller than the flange used in the vector...
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