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This paper reports on the patterning of a high‐aspect‐ratio aluminum‐doped zinc oxide (AZO) capacitive resonator based on the combination of the deep reactive ion etching (deep RIE) and atomic layer deposition (ALD) processes. The suspended AZO capacitive resonator is successfully demonstrated. Its resonant frequency is observed at 10.4 kHz with a quality factor (Q factor) of approximately 500 in...
We present the fabrication and evaluation of silicon micromechanical resonators fabricated by neutral beam etching (NBE) to obtain narrow capacitive gap size for small motional resistance and low insertion loss. The resonant frequency of the fabricated devices with a length of 500 μm, width of 440 μm and thickness of 5 μm is 9.66 MHz, and the average quality factor (Q) value is around 78,000. The...
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