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Nano-carbon needle films (NCNFs) coated with a 5-nm Au layer were prepared on p-type Si (100) substrates by means of quartz-tube type microwave plasma chemical vapor deposition (MWPCVD) at different total gas pressures and an electron beam (EB) method. The NCNF deposited at the total gas pressure of 60 Torr had better field emission (FE) characteristics due to the dense structure of carbon sheets,...
Nano-sheet carbon films (NSCFs) coated with a 2-nm Ti layer were fabricated on n-type Si (110) by means of a quartz-tube-type microwave-plasma chemical-vapour-deposition (MWPCVD) method with hydrogen–methane gas mixture and an electron beam (EB) evaporation method. The field emission (FE) properties of the NSCF were changed by depositing a thin Ti film on its surface. The threshold field was decreased...
Titanium dioxide (TiO 2 ) films have been successfully deposited on metal alloy substrates by radio-frequency magnetron reactive sputtering in an Ar+O 2 gas mixture. The effects of gas total pressure on the structure and phase transition of TiO 2 films were studied by X-ray diffraction and Raman spectra. It is suggested that the film structure changes from rutile to anatase...
The conductivity of nanometer TiO 2 thin films was presented in this paper. The dependence of the conductivity of TiO 2 thin films on the thickness of the film and the substrate material were educed. The TiO 2 films were deposited by reactive magnetron sputtering of a Ti targets in an Ar+O 2 mixture in a conventional sputtering reactor. The thickness of the films deposited...
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