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We present a complete description of “topological darkness” in a four-dimensional space regarding optical constants (i.e. n and k) of effective media, wavelengths and incident angles, which is essential for enhanced light-matter interaction in thin-films.
We develop a fundemantal strategy to enhance the light-matter interaction of ultra-thin films based on strong interference effect in planar nanocavities, and overcome the limitation between the absorption and film thickness of energy harvesting materials.
We demonstrate a simple, low-cost and large-area lithography-free method to fabricate three-layered metasurface structures with tunable, broadband and omnidirectional absorption properties.
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