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Presented is a new micromachining technology for high-yield fabrication of silicon AFM probes. Both tips and cantilevers are simultaneously formed with a masked-maskless-combined anisotropic etching process. The cantilever contour is firstly formed by masked etching. Then, the SiO2 etching mask is removed while the mask for tip-contour formation is remained. Following the combined etching is performed...
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